The report contains ten-year analysis with the following sections
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hermes microvision | 451 |
asml netherlands | 25 |
hermes testing solutions | 4 |
hermes-microvision (taiwan) | 1 |
hermes microvision | 55 |
asml netherlands | 25 |
Title of patent family (most common patent title) |
Family members |
Filing year |
---|---|---|
structure for discharging extreme ultraviolet mask | 16 | 2011 |
charged particle beam apparatus | 15 | 2013 |
a multi-axis magnetic lens | 13 | 2009 |
method and system for measuring critical dimension and monitoring fabrication uniformity | 11 | 2011 |
apparatus of plural charged-particle beams | 9 | 2015 |
apparatus of plural charged particle beams with multi-axis magnetic lens | 9 | 2010 |
charged particle source | 8 | 2014 |
apparatus of plural charged particle beams with multi-axis magnetic lens | 8 | 2010 |
apparatus of plural charged-particle beams | 8 | 2015 |
method and system of classifying defects on a wafer | 7 | 2008 |