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Title of patent family (most common patent title) |
Family members |
Filing year |
---|---|---|
chemical vapor deposition or epitaxial-layer growth reactor and supporter thereof | 11 | 2011 |
gas showerhead, method for making the same and thin film growth reactor | 10 | 2012 |
apparatus and method for controlling heating of base within chemical vapour deposition c… 🛈 | 9 | 2012 |
processing chamber, combination of processing chamber and loadlock, and system for proce… 🛈 | 8 | 2015 |
gas shower device, chemical vapor deposition device and method | 8 | 2014 |
method and device for measuring temperature of substrate in vacuum processing apparatus | 7 | 2012 |
electrode structure for icp etcher | 7 | 2015 |
coating packaged chamber parts for semiconductor plasma apparatus | 7 | 2012 |
cleaning apparatus and method, and film growth reaction apparatus and method | 7 | 2011 |
plasma reactor and method for manufacturing semiconductor substrate | 7 | 2012 |