The report contains ten-year analysis with the following sections
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aixtron se | 513 |
aixtron | 132 |
plasmasi | 11 |
graphene frontiers | 9 |
sartorius lab instruments & company | 6 |
centrotherm international | 3 |
ajkstron | 2 |
eugenus | 1 |
aixtron | 25 |
Title of patent family (most common patent title) |
Family members |
Filing year |
---|---|---|
apparatus and method for plasma processing | 21 | 2009 |
coating device, and method for operating a coating device with a shielding plate | 15 | 2010 |
method for depositing a thin-film polymer in a low-pressure gas phase | 14 | 2008 |
mocvd reactor having cylindrical gas inlet element | 14 | 2008 |
method for deposition of high-performance coatings and encapsulated electronic devices | 14 | 2013 |
method and apparatus for transfer of films among substrates | 14 | 2012 |
shadow mask held magnetically on a substrate support | 13 | 2008 |
cvd reactor having a substrate holder resting on a gas cushion comprising a plurality of… 🛈 | 13 | 2009 |
cvd method and cvd reactor | 13 | 2009 |
device for coating a large-surface-area substrate | 12 | 2014 |