The report contains ten-year analysis with the following sections
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aixtron | 203 |
aixtron se | 95 |
plasmasi | 13 |
genus | 3 |
ajkstron | 3 |
aixtron | 44 |
aixtron se | 7 |
Title of patent family (most common patent title) |
Family members |
Filing year |
---|---|---|
apparatus and method for plasma processing | 21 | 2009 |
coating device, and method for operating a coating device with a shielding plate | 15 | 2010 |
mocvd reactor having cylindrical gas inlet element | 14 | 2008 |
method for depositing a thin-film polymer in a low-pressure gas phase | 14 | 2008 |
cvd reactor having a substrate holder resting on a gas cushion comprising a plurality of… 🛈 | 13 | 2009 |
shadow mask held magnetically on a substrate support | 13 | 2008 |
cvd method and cvd reactor | 13 | 2009 |
method and apparatus for depositing thin layers of polymeric para-xylylene or substitute… 🛈 | 12 | 2008 |
cvd reactor and method for depositing a coating | 11 | 2009 |
device and method for simultaneously precipitating a plurality of semiconductor layers i… 🛈 | 11 | 2010 |