The report contains ten-year analysis with the following sections
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asm japan | 225 |
matsushita, kiyohiro | 4 |
ulvac | 2 |
nec corporation | 2 |
nabtesco corporation | 1 |
asm ip holding | 1 |
asm japan | 70 |
matsushita, kiyohiro | 2 |
nabtesco corporation | 1 |
ulvac | 1 |
nec corporation | 1 |
Title of patent family (most common patent title) |
Family members |
Filing year |
---|---|---|
method of forming metal oxide hardmask | 10 | 2010 |
shower plate electrode for plasma cvd reactor | 8 | 2007 |
position sensor system for substrate transfer robot | 7 | 2007 |
method of forming conformal film having si-n bonds on high-aspect ratio pattern | 7 | 2010 |
high-throughput semiconductor-processing apparatus equipped with multiple dual-chamber m… 🛈 | 7 | 2011 |
wafer-supporting device and method for producing same | 6 | 2011 |
method of forming conformal dielectric film having si-n bonds by pecvd | 6 | 2009 |
wafer processing apparatus with wafer alignment device | 6 | 2008 |
method for managing uv irradiation for curing semiconductor substrate | 6 | 2007 |
method for controlling semiconductor-processing apparatus | 6 | 2007 |