The report contains ten-year analysis with the following sections
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Title of patent family (most common patent title) |
Family members |
Filing year |
---|---|---|
process chamber and semiconductor processing apparatus | 14 | 2013 |
substrate etching method | 12 | 2012 |
reaction chamber and semi-conductor processing device | 10 | 2014 |
cassette positioning device and semiconductor processing apparatus | 10 | 2013 |
precleaning chamber and semiconductor processing device | 10 | 2013 |
substrate etching method and substrate processing device | 10 | 2011 |
vapour chamber and substrate processing equipment using same | 9 | 2010 |
tray apparatus, reaction chamber and mocvd device | 9 | 2012 |
atomic layer etching device and atomic layer etching method using same | 9 | 2014 |
inductive coupled coil and inductive coupled plasma device using the same | 9 | 2006 |