The report contains ten-year analysis with the following sections
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Title of patent family (most common patent title) |
Family members |
Filing year |
---|---|---|
substrate etching method and substrate processing device | 10 | 2011 |
reaction chamber and semi-conductor processing device | 10 | 2014 |
cassette positioning device and semiconductor processing apparatus | 10 | 2013 |
vapour chamber and substrate processing equipment using same | 9 | 2010 |
physical vapor deposition apparatus | 8 | 2012 |
precleaning chamber and plasma processing apparatus | 8 | 2014 |
magnetron and magnetron sputtering device | 7 | 2014 |
magnetron source, magnetron sputtering device and magnetron sputtering method | 7 | 2010 |
semiconductor structure and manufacturing method thereof | 6 | 2011 |
semiconductor processing device | 6 | 2015 |