The report contains ten-year analysis with the following sections
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d2s | 8 |
Title of patent family (most common patent title) |
Family members |
Filing year |
---|---|---|
method for optical proximity correction, design and manufacturing of a reticle using var… 🛈 | 80 | 2008 |
method and system for design of a reticle to be manufactured using variable shaped beam … 🛈 | 29 | 2008 |
method for fracturing and forming a pattern using curvilinear characters with charged pa… 🛈 | 29 | 2009 |
method and system for fracturing a pattern, and for charged particle beam lithography wi… 🛈 | 16 | 2009 |
method and system for forming patterns with charged particle beam lithography | 14 | 2011 |
method and system for optimization of an image on a substrate to be manufactured using o… 🛈 | 13 | 2011 |
method and system for forming patterns using charged particle beam lithograph | 12 | 2012 |
method and system for forming patterns using charged particle beam lithography | 12 | 2011 |
method for integrated circuit manufacturing and mask data preparation using curvilinear … 🛈 | 12 | 2010 |
lithography mask functional optimization and spatial frequency analysis | 9 | 2006 |