The report contains ten-year analysis with the following sections
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Title of patent family (most common patent title) |
Family members |
Filing year |
---|---|---|
spectrum based endpointing for chemical mechanical polishing | 62 | 2005 |
symmetric plasma process chamber | 49 | 2011 |
multilayer thin film device encapsulation using soft and pliable layer first | 45 | 2016 |
apparatus and method which reduce the erosion rate of surfaces exposed to halogen-contai… 🛈 | 41 | 2007 |
thin film transistors using multiple active channel layers | 40 | 2008 |
carrier head with retaining ring and carrier ring | 39 | 2006 |
in-situ dry clean chamber for front end of line fabrication | 35 | 2004 |
pulse train annealing method and apparatus | 35 | 2007 |
fabrication of base plate, fabrication of enclosure, and fabrication of support posts in… 🛈 | 34 | 2015 |
substrate edge tuning with retaining ring | 33 | 2010 |