The report contains ten-year analysis with the following sections
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cymer | 994 |
asml netherlands | 226 |
carl zeiss laser optics | 10 |
solexel | 5 |
tcz | 3 |
carl zeiss industrielle messtechnik | 2 |
trumpf lasersystems for semiconduc… 🛈 | 2 |
cymer | 131 |
carl zeiss laser optics | 3 |
carl zeiss industrielle messtechnik | 2 |
tcz | 1 |
cymer | 85 |
asml netherlands | 28 |
Title of patent family (most common patent title) |
Family members |
Filing year |
---|---|---|
system, method and apparatus for droplet catcher for prevention of backsplash in a euv g… 🛈 | 30 | 2009 |
laser system | 25 | 2005 |
gas management system for a laser-produced-plasma euv light source | 24 | 2007 |
laser produced plasma euv light source | 21 | 2007 |
very high power laser chamber optical improvements | 18 | 2008 |
target for laser produced plasma extreme ultraviolet light source | 17 | 2013 |
target for extreme ultraviolet light source | 15 | 2013 |
drive laser for euv light source | 14 | 2007 |
system method and apparatus for selecting and controlling light source bandwidth | 14 | 2008 |
filter for material supply apparatus | 14 | 2011 |