The report contains ten-year analysis with the following sections
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Title of patent family (most common patent title) |
Family members |
Filing year |
---|---|---|
methods and systems for utilizing design data in combination with inspection data | 63 | 2005 |
system and method for inspecting a workpiece surface using polarization of scattered lig… 🛈 | 34 | 2004 |
systems and methods for detecting defects on a wafer | 33 | 2009 |
multi-layer overlay metrology target and complimentary overlay metrology measurement sys… 🛈 | 29 | 2010 |
hydrogen passivation of nonlinear optical crystals | 29 | 2011 |
metrology systems and methods | 25 | 2009 |
apparatus and methods for determining overlay of structures having rotational or mirror … 🛈 | 24 | 2000 |
laser with high quality, stable output beam, and long life high conversion efficiency no… 🛈 | 24 | 2011 |
methods and systems for inspection of wafers and reticles using designer intent data | 23 | 2003 |
near field metrology | 20 | 2012 |