The report contains ten-year analysis with the following sections
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Title of patent family (most common patent title) |
Family members |
Filing year |
---|---|---|
improved chemical mechanical polishing pad and methods of making and using same | 29 | 2007 |
polishing pad and method for producing the same | 17 | 2007 |
dual-pore structure polishing pad | 15 | 2009 |
interpenetrating network for chemical mechanical polishing | 15 | 2007 |
stabilized chemical mechanical polishing composition and method of polishing a substrate | 15 | 2010 |
a chemical mechanical polishing pad having integral identification feature | 14 | 2008 |
a method for chemical mechanical polishing a substrate | 14 | 2009 |
method of polishing a substrate comprising polysilicon and at least one of silicon oxide… 🛈 | 14 | 2010 |
silicate composite polishing pad | 13 | 2010 |
method of chemical mechanical polishing a substrate with polishing composition adapted t… 🛈 | 13 | 2010 |