The report contains ten-year analysis with the following sections
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tel epion | 276 |
tel nexx | 8 |
tokyo electron | 5 |
tel epion | 51 |
tokyo electron | 5 |
tel epion | 9 |
Title of patent family (most common patent title) |
Family members |
Filing year |
---|---|---|
multiple nozzle gas cluster ion beam system and method | 14 | 2009 |
gcib nozzle assembly | 14 | 2014 |
method for increasing adhesion of copper to polymeric surfaces | 10 | 2013 |
gas cluster ion beam etching process for achieving target etch process metrics for multi… 🛈 | 10 | 2011 |
method to alter silicide properties using gcib treatment | 10 | 2009 |
process gas enhancement for beam treatment of a substrate | 9 | 2014 |
gas cluster ion beam system with rapid gas switching apparatus | 9 | 2010 |
method to improve electrical leakage performance and to minimize electromigration in sem… 🛈 | 9 | 2007 |
method for growing a thin film using a gas cluster ion beam | 8 | 2008 |
molecular beam enhanced gcib treatment | 8 | 2013 |