The report contains ten-year analysis with the following sections
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asml netherlands | 14186 |
cymer | 363 |
carl zeiss smt | 213 |
brion technologies | 78 |
philips electronics | 72 |
asml masktools | 45 |
hermes microvision | 26 |
xicato | 18 |
sidelnikov, yurii victorovitch | 16 |
zeiss carl smt | 11 |
asml netherlands | 1303 |
hermes microvision | 26 |
carl zeiss smt | 16 |
cymer | 14 |
xicato | 6 |
asmil netherlands | 1 |
carl zeiss | 1 |
aslm netherlands | 1 |
westinghouse electric corporation | 1 |
lam research corporation | 1 |
Title of patent family (most common patent title) |
Family members |
Filing year |
---|---|---|
lithographic apparatus and device manufacturing method | 69 | 2002 |
lithographic apparatus and device manufacturing method | 47 | 2004 |
lithographic apparatus and method | 34 | 2010 |
lithographic apparatus and device manufacturing method | 34 | 2008 |
lithographic apparatus and device manufacturing method | 31 | 2005 |
lithographic apparatus and device manufacturing method | 31 | 2003 |
system, method and apparatus for droplet catcher for prevention of backsplash in a euv g… 🛈 | 30 | 2009 |
method and apparatus to determine a patterning process parameter | 30 | 2016 |
methods for model-based process simulation | 30 | 2008 |
pattern selection for full-chip source and mask optimization | 30 | 2009 |