The report contains ten-year analysis with the following sections
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Title of patent family (most common patent title) |
Family members |
Filing year |
---|---|---|
magnetoresistance effect device and method of production of the same | 24 | 2004 |
substrate treatment device and method | 21 | 2013 |
manufacturing apparatus | 19 | 2010 |
sputtering device, deposition method and control device | 17 | 2010 |
ion beam processing method and ion beam processing device | 15 | 2012 |
sputtering apparatus and sputtering method | 15 | 2008 |
method for manufacturing semiconductor device, ion beam etching device, and control devi… 🛈 | 15 | 2012 |
method for manufacturing magnetoresistance element and apparatus for manufacturing magne… 🛈 | 14 | 2006 |
sputtering device, target and shield | 14 | 2011 |
sputtering device and substrate treatment device | 14 | 2012 |