The report contains ten-year analysis with the following sections
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axcelis technologies | 817 |
axcelis tech | 107 |
lam research corporation | 14 |
reynolds, william | 2 |
axcelis techenologies | 1 |
acelis technologies. | 1 |
axcelis technologiesm | 1 |
axcebs technologies | 1 |
axcelis technologies | 107 |
axcelis tech | 28 |
axcebs technologies | 1 |
axcelis technologies | 60 |
Title of patent family (most common patent title) |
Family members |
Filing year |
---|---|---|
gas bearing eletrostatic chuck | 14 | 2008 |
heated electrostatic chuck including mechanical clamp capability at high temperature | 13 | 2010 |
system and method for ion implantation with improved productivity and uniformity | 12 | 2011 |
low contamination, low energy beamline architecture for high current ion implantation | 12 | 2008 |
method for reciprocating a workpiece through an ion beam | 12 | 2004 |
method and apparatus for measurement of beam angle in ion implantation | 11 | 2008 |
system and method of controlling broad beam uniformity | 11 | 2008 |
post-decel magnetic energy filter for ion implantation systems | 11 | 2008 |
method and apparatus for cleaning residue from an ion source component | 11 | 2009 |
method and apparatus for improved uniformity control with dynamic beam shaping | 11 | 2011 |