The report contains ten-year analysis with the following sections
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carl zeiss sms | 363 |
carl zeiss smt | 98 |
nawotec | 42 |
carl zeiss | 19 |
pixer technology | 12 |
zeiss carl sms. | 6 |
synopsys | 5 |
carl zeiss nts | 5 |
olympus corporation | 4 |
carl zeiss meditec | 4 |
carl zeiss sms | 50 |
nawotec | 10 |
synopsys | 3 |
pixer technology | 2 |
olympus corporation | 1 |
carl zeiss smt | 1 |
carl zeiss | 1 |
carl zeiss jena | 1 |
carl zeiss nts | 1 |
zeiss carl sms. | 1 |
carl zeiss smt | 20 |
carl zeiss | 5 |
carl zeiss sms | 4 |
nawotec | 2 |
carl zeiss meditec | 1 |
Title of patent family (most common patent title) |
Family members |
Filing year |
---|---|---|
method for processing an object with miniaturized structures | 15 | 2008 |
method and apparatus for analyzing and for removing a defect of an euv photomask | 14 | 2011 |
method for electron beam induced etching | 13 | 2008 |
methods and systems for removing a material from a sample | 13 | 2007 |
method and apparatus for processing a substrate with a focussed particle beam | 12 | 2011 |
method for electron beam induced etching of layers contaminated with gallium | 12 | 2008 |
method and apparatus for correcting errors on a wafer processed by a photolithographic m… 🛈 | 11 | 2010 |
method for electron beam induced deposition of conductive material | 11 | 2008 |
method for determining a repair shape of a defect on or in the vicinity of an edge of a … 🛈 | 9 | 2008 |
apparatus and method for investigating or modifying a surface with a beam of charged par… 🛈 | 9 | 2004 |