The report contains ten-year analysis with the following sections
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picosun | 234 |
hauzer techno coating | 16 |
schaeffler technologies & company | 14 |
ihi hauzer techno coating | 3 |
schaeffler a. g. | 2 |
picocun | 1 |
picosun | 2 |
picosun | 31 |
Title of patent family (most common patent title) |
Family members |
Filing year |
---|---|---|
apparatus and methods for deposition reactors | 34 | 2008 |
atomic layer deposition with plasma source | 23 | 2011 |
deposition reactor with plasma source | 18 | 2011 |
substrate loading in an ald reactor | 16 | 2012 |
an atomic layer deposition reactor for processing a batch of substrates and method thereā¦ 🛈 | 16 | 2011 |
atomic layer deposition apparatus and loading methods | 15 | 2008 |
protecting a target pump interior with an ald coating | 15 | 2013 |
methods and apparatus for deposition reactors | 14 | 2008 |
current insulated bearing components and bearings | 13 | 2012 |
forming a substrate web track in an atomic layer deposition reactor | 12 | 2013 |