The report contains ten-year analysis with the following sections
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tokyo electron | 914 |
tokyo electron us holdings | 202 |
nustep | 7 |
tel solar | 3 |
tokyo electron europe | 3 |
tokyo electron | 1 |
tokyo electron | 209 |
tokyo electron us holdings | 36 |
nustep | 1 |
Title of patent family (most common patent title) |
Family members |
Filing year |
---|---|---|
use of topography to direct assembly of block copolymers in grapho-epitaxial applications | 24 | 2013 |
method for chemical polishing and planarization | 17 | 2013 |
methods of forming etch masks for sub-resolution substrate patterning | 16 | 2015 |
substrate backside texturing | 15 | 2013 |
substrate tuning system and method using optical projection | 13 | 2013 |
method of endpoint detection of plasma etching process using multivariate analysis | 13 | 2012 |
method and system for performing post-etch annealing of a workpiece | 12 | 2014 |
sidewall protection of low-k material during etching and ashing | 11 | 2012 |
method and apparatus for increased recirculation and filtration in a photoresist dispens… 🛈 | 11 | 2014 |
colloidal silica growth inhibitor and associated method and system | 11 | 2016 |